Sign In
Sign Up
-
/
5
0 votes
Share
Advanced Ta-based diffusion barriers for Cu interconnects
Status
Rate
Check Later
Authors
Rene Hubner
Subjects
Integrated Circuits
Diffusion
Interconnects (Integrated Circuit Technology)
Electrodiffusion
Reviews (0)
see more
Seems like you haven't provided a review
Don't miss the opportunity to
share your thoughts
!
Similar Books
see more
Similar Movies
see more
Similar TV Series
see more
Similar Games
see more